Plasmionique


They extend, and commercialise plasma, vacuum and laser based processes.
Plasmonique was established in 1999. This company takes up developing and commercializing plasma- and vacuum-based processes and tools for application in advanced surface engineering and nanotechnology.
Their products consist of complete integrated systems for thin-film synthesis and surface science using the special applications - physical vapour deposition (PVD), plasma-enhanced chemical vapour deposition (PECVD), and pulsed laser deposition (PLD). Their systems include sputtering magnetrons, RF or microwave plasma sources, organic or metallic thermal evaporators, as well as versatile substrate mounting assemblies.
Their products consist of complete integrated systems for thin-film synthesis and surface science using the special applications - physical vapour deposition (PVD), plasma-enhanced chemical vapour deposition (PECVD), and pulsed laser deposition (PLD). Their systems include sputtering magnetrons, RF or microwave plasma sources, organic or metallic thermal evaporators, as well as versatile substrate mounting assemblies.
Business Type: Nanotextile » | Biotechnology » | Electrotechnics » |
Plasmionique171B, 1650 boul. Lionel-Boutet |
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