GenISys develops, markets and supports flexible, high-performance software solutions for the optimization of micro- and nano fabrication processes.
Addressing the market for lithography and inspection, GenISys combines deep technical expertise in layout data processing, process modeling, correction and optimization with world class software engineering and a strong focus on ease of use for applications in IC prototyping, mask production, DfM development and MEMS. For e-beam direct write and mask manufacturing, our data preparation and proximity effect correction software helps to push the limits of e-Beam technology.
Business Type: Nanotextile » | Biotechnology » | Electrotechnics » |
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