Vistec Electron Beam
Main Activity in Nanotechnology
Electron Beam Lithography Systems
As a long-standing equipment supplier, Vistec Electron Beam GmbH is providing leading technology solutions for advanced electron-beam lithography (EBL).
Based on the Variable Shaped Beam (VSB) principle, the electron-beam lithography systems are mainly utilized for semiconductor applications and advanced research as silicon direct write, compound semiconductor, mask making as well as integrated optics and several new emerging markets. Among standardized and proven systems, Vistec Electron Beam also provides customized solutions according to special technology requirements.